Top-down fabrication of Si nanotube arrays using nanoimprint lithography and spacer patterning for electronic and optoelectronic applications
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2024-12-24 03:16:43 +0900 更新時刻: 2026-10-15 04:32:27 +0900