HOME > 論文 > 書誌詳細Deep Dry Etching of Quartz Plate Over 100μm in Depth Employing Ultra-thick Photoresist(SU-8)Takayuki Fukasawa, Yasuhiro Horiike. Japanese Journal of Applied Physics 42 [Part 1, No. 6A] 3702-3706. 2003.https://doi.org/10.1143/jjap.42.3702 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 12:02:26 +0900 更新時刻: 2026-09-02 05:46:25 +0900
