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Modification of thermal conductivity and thermal boundary resistance of amorphous Si thin films by Al doping
(アルミニウムドーピングを用いたアモルファスシリコン薄膜の熱伝導率と界面熱抵抗の変化)

Tianzhuo Zhan, Masahiro Goto, Yibin Xu, Yohei Kinoshita, Mamoru Ishikiriyama, Chikashi Nishimura.

RSC Advances 7 [13] 7901-7905. 2017.

https://doi.org/10.1039/c6ra27437d

Open Access Royal Society of Chemistry (RSC) (Publisher)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2017-02-27 00:51:17 +0900 Updated at: 2026-10-29 05:39:25 +0900

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