HOME > 論文 > 書誌詳細Migration Processes of the 30° Partial Dislocation in SiliconNorihisa Oyama, Takahisa Ohno. Physical Review Letters 93 [19] 195502. 2004.https://doi.org/10.1103/physrevlett.93.195502 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 14:34:02 +0900更新時刻: 2024-04-02 06:14:33 +0900
