HOME > Article > DetailMigration Processes of the 30° Partial Dislocation in SiliconNorihisa Oyama, Takahisa Ohno. Physical Review Letters 93 [19] 195502. 2004.https://doi.org/10.1103/physrevlett.93.195502 NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at :2016-05-24 14:34:02 +0900 Updated at :2022-01-10 16:08:59 +0900