HOME > 論文 > 書誌詳細Anisotropic Oxygen Reactive Ion Etching for Removing Residual Layers from 45 nm-width Imprint PatternsTakuya Uehara, Shoichi Kubo, Nobuya Hiroshiba, Masaru Nakagawa. Journal of Photopolymer Science and Technology 29 [2] 201-208. 2016.https://doi.org/10.2494/photopolymer.29.201 Open Access Technical Association of Photopolymers, Japan (Publisher) NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-10-26 15:44:49 +0900 更新時刻: 2026-05-26 05:05:33 +0900
