Anisotropic Oxygen Reactive Ion Etching for Removing Residual Layers from 45 nm-width Imprint Patterns | SAMURAI, NIMS Researchers Directory Service

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Anisotropic Oxygen Reactive Ion Etching for Removing Residual Layers from 45 nm-width Imprint Patterns

Takuya Uehara, Shoichi Kubo, Nobuya Hiroshiba, Masaru Nakagawa.

Journal of Photopolymer Science and Technology 29 [2] 201-208. 2016.

https://doi.org/10.2494/photopolymer.29.201

Open Access Technical Association of Photopolymers, Japan (Publisher)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-10-26 15:44:49 +0900Updated at: 2024-05-02 05:18:39 +0900

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