Evaluation of potential variations around grain boundaries in BaSi<sub>2</sub> epitaxial films by Kelvin probe force microscopy | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Evaluation of potential variations around grain boundaries in BaSi2 epitaxial films by Kelvin probe force microscopy
(ケルビンプローブフォース顕微鏡によるBaSi2エピ膜の粒界ポテンシャル評価)

Masakazu Baba, Sadahiro Tsurekawa, Kentaro Watanabe, W. Du, Kaoru Toko, Kosuke O. Hara, Noritaka Usami, Takashi Sekiguchi, Takashi Suemasu.

Applied Physics Letters 103 [14] 142113. 2013.

https://doi.org/10.1063/1.4824335

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作成時刻: 2016-05-24 17:14:25 +0900更新時刻: 2024-03-31 11:47:26 +0900

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