Characterization of Impurity Doping and Stress in Si/Ge and Ge/Si Core–Shell Nanowires
(Si/GeおよびGe/Siコアシェルナノワイヤ中への不純物ドーピングと応力評価)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 16:50:42 +0900 Updated at: 2026-10-08 06:36:57 +0900