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Characterization of Impurity Doping and Stress in Si/Ge and Ge/Si Core–Shell Nanowires
(Si/GeおよびGe/Siコアシェルナノワイヤ中への不純物ドーピングと応力評価)

Naoki Fukata, Masanori Mitome, Takashi Sekiguchi, Yoshio Bando, Melanie Kirkham, Jung-Il Hong, Zhong Lin Wang, Robert L. Snyder.
ACS Nano 6 [10] 8887-8895. 2012.

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      Created at :2016-05-24 16:50:42 +0900 Updated at :2018-12-19 07:00:25 +0900

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