Isotopic labeling study of the oxygen diffusion in HfO2/SiO2/Si

Ming Zhao; Kaoru Nakajima; Motofumi Suzuki; Kenji Kimura; Masashi Uematsu; Kazuyoshi Torii; Satoshi Kamiyama; Yasuo Nara; Heiji Watanabe; Kenji Shiraishi; Toyohiro Chikyow; Keisaku Yamada

doi:10.1063/1.2717539

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Isotopic labeling study of the oxygen diffusion in HfO2/SiO2/Si

Ming Zhao, Kaoru Nakajima, Motofumi Suzuki, Kenji Kimura, Masashi Uematsu, Kazuyoshi Torii, Satoshi Kamiyama, Yasuo Nara, Heiji Watanabe, Kenji Shiraishi, Toyohiro Chikyow, Keisaku Yamada.

Applied Physics Letters 90 [13] 133510. 2007.

https://doi.org/10.1063/1.2717539

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知京豊裕

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 15:25:41 +0900更新時刻: 2024-04-01 18:24:18 +0900