MAIN FACTORS FOR OBTAINING GOOD SHAPE MEMORY PROPERTIES IN SPUTTER-DEPOSITED THIN FILMS OF Ti-Ni BASED ALLOYS
(Ti-Ni基合金スパッター薄膜の形状記憶特性を向上させるための主要因子 )
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-11-15 00:39:50 +0900Updated at: 2022-11-15 00:39:50 +0900