HOME > 論文 > 書誌詳細Si surface passivation by using triode-type plasma-enhanced chemical vapor deposition with thermally energized film-precursorsChisato Niikura, Yuta Shiratori, Shinsuke Miyajima. The European Physical Journal Applied Physics 89 [1] 10101. 2020.https://doi.org/10.1051/epjap/2020190299 NIMS著者新倉 ちさとMaterials Data Repository (MDR)上の本文・データセット作成時刻: 2020-04-04 03:01:06 +0900更新時刻: 2024-04-02 01:43:22 +0900
