HOME > Article > DetailStructurally Controlled Large-Area 10 nm Pitch Graphene Nanomesh by Focused Helium Ion Beam MillingMarek Edward Schmidt, Takuya Iwasaki, Manoharan Muruganathan, Mayeesha Haque, Huynh Van Ngoc, Shinichi Ogawa, Hiroshi Mizuta. ACS Applied Materials & Interfaces 10 [12] 10362-10368. 2018.https://doi.org/10.1021/acsami.8b00427 NIMS author(s)IWASAKI, TakuyaFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2018-04-25 20:59:17 +0900 Updated at: 2026-10-03 05:28:28 +0900
