HOME > 論文 > 書誌詳細Structurally Controlled Large-Area 10 nm Pitch Graphene Nanomesh by Focused Helium Ion Beam MillingMarek Edward Schmidt, Takuya Iwasaki, Manoharan Muruganathan, Mayeesha Haque, Huynh Van Ngoc, Shinichi Ogawa, Hiroshi Mizuta. ACS Applied Materials & Interfaces 10 [12] 10362-10368. 2018.https://doi.org/10.1021/acsami.8b00427 NIMS著者岩崎 拓哉Materials Data Repository (MDR)上の本文・データセット作成時刻: 2018-04-25 20:59:17 +0900更新時刻: 2024-09-08 05:35:15 +0900
