HOME > 論文 > 書誌詳細Epitaxial growth of γ-Ga2O3 films by mist chemical vapor depositionTakayoshi Oshima, Taishi Nakazono, Akira Mukai, Akira Ohtomo. Journal of Crystal Growth 359 60-63. 2012.https://doi.org/10.1016/j.jcrysgro.2012.08.025 NIMS著者大島 孝仁Materials Data Repository (MDR)上の本文・データセット作成時刻: 2021-11-12 11:25:41 +0900更新時刻: 2024-04-02 02:22:02 +0900
