Formation of near-vertical trenches and fins with flat {−201} sidewalls on (512) β-Ga <sub>2</sub> O <sub>3</sub> via TMAH wet etching | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Formation of near-vertical trenches and fins with flat {−201} sidewalls on (512) β-Ga ₂ O ₃ via TMAH wet etching

Takayoshi Oshima.

Science and Technology of Advanced Materials 27 [1] 2726186. 2026.

https://doi.org/10.1080/14686996.2026.2726186

Open Access Informa UK Limited (Publisher) Materials Data Repository (MDR)

NIMS著者

大島孝仁

Materials Data Repository (MDR)上の本文・データセット

MDRavailable Formation of near-vertical trenches and fins with flat {−201} sidewalls on (512) β-Ga <sub>2</sub> O <sub>3</sub> via TMAH wet etching

作成時刻: 2026-09-25 03:07:10 +0900 更新時刻: 2026-09-29 03:09:33 +0900

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