HOME > 論文 > 書誌詳細Electrical properties of atomic layer deposited HfO2/Al2O3 multilayer on diamondJiangwei Liu, Meiyong Liao, Masataka Imura, Hirotaka Oosato, Eiichiro Watanabe, Yasuo Koide. Diamond and Related Materials 54 55-58. 2015.https://doi.org/10.1016/j.diamond.2014.10.004 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 17:34:34 +0900更新時刻: 2024-09-12 06:06:29 +0900
