HOME > Article > DetailElectrical properties of atomic layer deposited HfO2/Al2O3 multilayer on diamondJiangwei Liu, Meiyong Liao, Masataka Imura, Hirotaka Oosato, Eiichiro Watanabe, Yasuo Koide. Diamond and Related Materials 54 55-58. 2015.https://doi.org/10.1016/j.diamond.2014.10.004 NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 17:34:34 +0900 Updated at: 2026-05-03 05:54:07 +0900
