Wet etching of (−102) β-Ga <sub>2</sub> O <sub>3</sub> with tetramethylammonium hydroxide (TMAH) | SAMURAI, NIMS Researchers Directory Service

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Wet etching of (−102) β-Ga ₂ O ₃ with tetramethylammonium hydroxide (TMAH)

Takayoshi Oshima.

Science and Technology of Advanced Materials 27 [1] 2666988. 2026.

https://doi.org/10.1080/14686996.2026.2666988

Open Access Informa UK Limited (Publisher) Materials Data Repository (MDR)

NIMS author(s)

OSHIMA, Takayoshi

Fulltext and dataset(s) on Materials Data Repository (MDR)

MDRavailable Wet etching of (−102) β-Ga <sub>2</sub> O <sub>3</sub> with tetramethylammonium hydroxide (TMAH)

Created at: 2026-06-12 03:07:28 +0900 Updated at: 2026-08-14 04:33:12 +0900

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