The effect of the substrate on thermal stability of CeO<i><sub>x</sub></i>and Rh-Ce-O thin films

Klára Ševčíková; Václav Nehasil; Tatiana Zahoranová; Mykhaylo Vorokhta; Nataliya Tsud; Hideki Yoshikawa; Masaaki Kobata; Keisuke Kobayashi; Vladimír Matolín; Klára Ševčíková; Václav Nehasil; Tatiana Zahoranová; Mykhaylo Vorokhta; Nataliya Tsud; Hideki Yoshikawa; Masaaki Kobata; Keisuke Kobayashi; Vladimír Matolín

doi:10.1002/sia.5503

The effect of the substrate on thermal stability of CeO_xand Rh-Ce-O thin films
(CeOxおよびRh-Ce-O薄膜の熱的安定性に及ぼす基板の効果)

Klára Ševčíková, Václav Nehasil, Tatiana Zahoranová, Mykhaylo Vorokhta, Nataliya Tsud, Hideki Yoshikawa, Masaaki Kobata, Keisuke Kobayashi, Vladimír Matolín.

Surface and Interface Analysis 46 [10-11] 980-983. 2014.

https://doi.org/10.1002/sia.5503

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 17:38:47 +0900 Updated at: 2026-10-08 05:39:45 +0900

The effect of the substrate on thermal stability of CeOxand Rh-Ce-O thin films(CeOxおよびRh-Ce-O薄膜の熱的安定性に及ぼす基板の効果)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

The effect of the substrate on thermal stability of CeO_xand Rh-Ce-O thin films
(CeOxおよびRh-Ce-O薄膜の熱的安定性に及ぼす基板の効果)