CeOxおよびRh-Ce-O薄膜の熱的安定性に及ぼす基板の効果

Klára Ševčíková; Václav Nehasil; Tatiana Zahoranová; Mykhaylo Vorokhta; Nataliya Tsud; Hideki Yoshikawa; Masaaki Kobata; Keisuke Kobayashi; Vladimír Matolín

doi:10.1002/sia.5503

HOME > 論文 > 書誌詳細

The effect of the substrate on thermal stability of CeOxand Rh-Ce-O thin films
(CeOxおよびRh-Ce-O薄膜の熱的安定性に及ぼす基板の効果)

Klára Ševčíková, Václav Nehasil, Tatiana Zahoranová, Mykhaylo Vorokhta, Nataliya Tsud, Hideki Yoshikawa, Masaaki Kobata, Keisuke Kobayashi, Vladimír Matolín.

Surface and Interface Analysis 46 [10-11] 980-983. 2014.

https://doi.org/10.1002/sia.5503

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 17:38:47 +0900更新時刻: 2024-04-02 03:49:53 +0900

The effect of the substrate on thermal stability of CeOxand Rh-Ce-O thin films(CeOxおよびRh-Ce-O薄膜の熱的安定性に及ぼす基板の効果)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

The effect of the substrate on thermal stability of CeOxand Rh-Ce-O thin films
(CeOxおよびRh-Ce-O薄膜の熱的安定性に及ぼす基板の効果)