Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moiré fringes
(Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moir´e fringes)
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2016-05-24 16:43:44 +0900 更新時刻: 2026-05-03 05:40:35 +0900