Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moiré fringes
(Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moir´e fringes)
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
作成時刻 :2016-05-24 16:43:44 +0900 更新時刻 :2022-10-21 18:44:44 +0900