Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moiré fringes
(Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moir´e fringes)
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Created at: 2016-05-24 16:43:44 +0900 Updated at: 2026-07-05 05:39:45 +0900