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著者名Takahiro Nagata, Masamitsu Haemori, Yoshiyuki Yamashita, Hideki Yoshikawa, Keisuke Kobayashi, Toyohiro Chikyow.
タイトルObservation of filament formation process of Cu/HfO2/Pt ReRAM structure by hard x-ray photoelectron spectroscopy under bias operation
掲載誌名Journal of Materials Research 27 [06] 869-878
ISSN: 08842914 20445326
発表年2012
言語English
ESIでのカテゴリMATERIALS SCIENCE
DOIhttps://doi.org/10.1557/jmr.2011.448
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