HOME > 論文 > 書誌詳細Measurement of valence-band offset at native oxide/BaSi2 interfaces by hard x-ray photoelectron spectroscopyRyota Takabe, Weijie Du, Keita Ito, Hiroki Takeuchi, Kaoru Toko, Shigenori Ueda, Akio Kimura, Takashi Suemasu. Journal of Applied Physics 119 [2] 025306. 2016.https://doi.org/10.1063/1.4939614 NIMS著者上田 茂典Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 17:59:42 +0900更新時刻: 2024-04-01 18:45:13 +0900
