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Measurement of valence-band offset at native oxide/BaSi2 interfaces by hard x-ray photoelectron spectroscopy

Ryota Takabe, Weijie Du, Keita Ito, Hiroki Takeuchi, Kaoru Toko, Shigenori Ueda, Akio Kimura, Takashi Suemasu.
Journal of Applied Physics 119 [2] 025306. 2016.
https://doi.org/10.1063/1.4939614

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    Created at: 2016-05-24 17:59:42 +0900Updated at: 2025-01-10 05:23:42 +0900

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