Fabrication of 300A Thick BiSrCaCuO Thin Films with Tc of 108K by Use of Ion Implantation.
(イオン注入を利用したTc=108K超薄膜(膜厚300A)の作製.)
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Created at: 2016-05-24 11:33:24 +0900 Updated at: 2018-12-14 22:02:10 +0900