Tomohiro Kubota; Takeshi Hashimoto; Yasushi Ishikawa; Seiji Samukawa; Atsushi Miura; Yukiharu Uraoka; Takashi Fuyuki; Masaki Takeguchi; Kensuke Nishioka; Ichiro Yamashita

doi:10.1063/1.2404608

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Charging and Coulomb staircase effects in silicon nanodisk structures fabricated by defect0free Cl neutral etching process

Tomohiro Kubota, Takeshi Hashimoto, Yasushi Ishikawa, Seiji Samukawa, Atsushi Miura, Yukiharu Uraoka, Takashi Fuyuki, Masaki Takeguchi, Kensuke Nishioka, Ichiro Yamashita.

Applied Physics Letters 89 [23] 233127. 2006.

https://doi.org/10.1063/1.2404608

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作成時刻: 2016-05-24 15:06:38 +0900更新時刻: 2024-04-01 18:21:06 +0900