HOME > Article > DetailAnalysis of In x Ga1− x N growth rate in atmospheric-pressure metal-organic vapor phase epitaxy: Insights into incorporation and desorption processes of GaN and InN for precise growth controlMasataka Imura, Takanobu Hiroto, Takaaki Mano, Yuri Itokazu, Masafumi Jo. Journal of Applied Physics 139 [11] 115703. 2026.https://doi.org/10.1063/5.0307826 Open Access AIP Publishing (Publisher) Materials Data Repository (MDR) NIMS author(s)IMURA, MasatakaHIROTO, TakanobuMANO, TakaakiFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Analysis of In <i>x</i> Ga1− <i>x</i> N growth rate in atmospheric-pressure metal-organic vapor phase epitaxy: Insights into incorporation and desorption processes of GaN and InN for precise growth control Created at: 2026-03-20 03:06:45 +0900 Updated at: 2026-05-22 04:34:28 +0900