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Field-Emission Activation on Boron-Doped Chemical-Vapor-Deposited

Yang-Do Kim, Woon Choi, Chae-Hyun Wang, Toshihiro Ando, Hyeongtag Jeon, Si-Young Chang, Hajime Tomokage.

Japanese Journal of Applied Physics 41 [Part 1, No. 5A] 3081-3084. 2002.

作成時刻: 2016-05-24 11:53:45 +0900更新時刻: 2024-04-01 21:05:48 +0900