HOME > 論文 > 書誌詳細Field-Emission Activation on Boron-Doped Chemical-Vapor-DepositedYang-Do Kim, Woon Choi, Chae-Hyun Wang, Toshihiro Ando, Hyeongtag Jeon, Si-Young Chang, Hajime Tomokage. Japanese Journal of Applied Physics 41 [Part 1, No. 5A] 3081-3084. 2002.https://doi.org/10.1143/jjap.41.3081 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 11:53:45 +0900 更新時刻: 2026-04-26 05:44:34 +0900
