Effects of Electronic Energy Deposition on Nanoparticle Distribution under High-Flux Cu- Implantation into Insulators | SAMURAI, NIMS Researchers Directory Service

Scheduled downtime (October 31st and November 1st, 2026) (2026-10-29)

HOME > Article > Detail

Effects of Electronic Energy Deposition on Nanoparticle Distribution under High-Flux Cu- Implantation into Insulators
(絶縁体への高粒子束Cu-注入におけるナノ粒子分布に及ぼす電子励起エネルギー付与効果)

梅田直樹, KISHIMOTO, Naoki, TAKEDA, Yoshihiko, 李致圭.

Material Research Society Symposium Proceedings . .

NIMS author(s)

TAKEDA, Yoshihiko

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2022-11-15 00:39:48 +0900 Updated at: 2022-11-15 00:39:48 +0900

▲ Go to the top of this page