Ion Beam Modification of BiSrCaCuO Ultrathin Films of Nearly Three Half-Unit Cell Thickness | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Ion Beam Modification of BiSrCaCuO Ultrathin Films of Nearly Three Half-Unit Cell Thickness
(約３副単位格子厚さのBiSrCaCuO超薄膜のイオンビーム改質)

斎藤一男, Masatsugu Kaise, 柳宗勲, Jonghun You, Kazuo Saito.

Japanese Journal of Applied Physics 35 [Part 2, No. 3B] L387-L390. 1996.

https://doi.org/10.1143/jjap.35.l387

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作成時刻: 2016-05-24 11:36:24 +0900更新時刻: 2024-05-02 10:17:11 +0900

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