HOME > 論文 > 書誌詳細Bias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfacesYoshiyuki Yamashita, Hideki Yoshikawa, Toyohiro Chikyow, Keisuke Kobayashi. Journal of Applied Physics 113 [16] 163707. 2013.https://doi.org/10.1063/1.4803491 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 17:01:26 +0900更新時刻: 2024-03-31 13:07:29 +0900
