Bias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces | SAMURAI, NIMS Researchers Directory Service

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Bias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces

Yoshiyuki Yamashita, Hideki Yoshikawa, Toyohiro Chikyow, Keisuke Kobayashi.

Journal of Applied Physics 113 [16] 163707. 2013.

https://doi.org/10.1063/1.4803491

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Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 17:01:26 +0900 Updated at: 2026-10-30 06:48:40 +0900

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