HOME > 論文 > 書誌詳細Implantation temperature dependence of Si activation in AlGaNY. Irokawa, O. Ishiguro, T. Kachi, S. J. Pearton, F. Ren. Applied Physics Letters 88 [18] 182106. 2006.https://doi.org/10.1063/1.2200283 NIMS著者色川 芳宏Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 15:06:24 +0900更新時刻: 2024-04-01 20:57:10 +0900