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Recrystallization and Reactivation of Dopant Atoms in Ion-Implanted Silicon Nanowires
(イオン注入されたシリコンナノワイヤの再結晶化とドーパントの再活性化過程)

Naoki Fukata, Ryo Takiguchi, Shinya Ishida, Shigeki Yokono, Shunichi Hishita, Kouichi Murakami.
ACS Nano 6 [4] 3278-3283. 2012.

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      Created at: 2016-05-24 16:41:50 +0900Updated at: 2024-05-03 07:38:07 +0900

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