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Behavior of ion-implanted As atoms in Si during molybdenum disilicide formation

T.Chikyow, H.Kawarada, K.Konuma, M.Kakumu, M.KItamua, I.Kimura, K.Yoneda, Iwao Ohdomari, Toyohiro Chikyow, Hiroshi Kawarada, Kazuo Konuma, Masakazu Kakumu, Kazuhiko Hashimoto, Itsuro Kimura, Kenji Yoneda.
Journal of Applied Physics 59 [9] 3073-3076. 1986.

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      作成時刻 :2016-05-24 11:22:26 +0900 更新時刻 :2020-11-16 23:16:29 +0900

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