Quantum chemical study on the oxidation process of a hydrogen terminated Si surface

Teraishi; H.Takaba; A.Yamada; A.Endou; I.Gunji; A.Chaterjee; A.Miyamoto; K.Nakamura; M; Kitajima; Kazuo Teraishi; Hiromitsu Takaba; Aruba Yamada; Akira Endou; Isao Gunji; Abhijit Chatterjee; Momoji Kubo; Akira Miyamoto; Kazutaka Nakamura; Masahiro Kitajima; Teraishi; H.Takaba; A.Yamada; A.Endou; I.Gunji; A.Chaterjee; A.Miyamoto; K.Nakamura; M; Kitajima; Kazuo Teraishi; Hiromitsu Takaba; Aruba Yamada; Akira Endou; Isao Gunji; Abhijit Chatterjee; Momoji Kubo; Akira Miyamoto; Kazutaka Nakamura; Masahiro Kitajima

doi:10.1063/1.476700

HOME > 論文 > 書誌詳細

(Quantum chemical study on the oxidation process of a hydrogen terminated Si surface)

Teraishi, H.Takaba, A.Yamada, A.Endou, I.Gunji, A.Chaterjee, A.Miyamoto, K.Nakamura, M, Kitajima, Kazuo Teraishi, Hiromitsu Takaba, Aruba Yamada, Akira Endou, Isao Gunji, Abhijit Chatterjee, Momoji Kubo, Akira Miyamoto, Kazutaka Nakamura, Masahiro Kitajima.

The Journal of Chemical Physics 109 [4] 1495-1504. 1998.

https://doi.org/10.1063/1.476700

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 11:21:59 +0900 更新時刻: 2026-11-02 04:57:01 +0900