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Quantum chemical study on the oxidation process of a hydrogen terminated Si surface

著者Kazuo Teraishi, Hiromitsu Takaba, Aruba Yamada, Akira Endou, Isao Gunji, Abhijit Chatterjee, Momoji Kubo, Akira Miyamoto, Kazutaka Nakamura, Masahiro Kitajima.
掲載誌名The Journal of Chemical Physics 109 [4] 1495-1504
出版社AIP Publishing
発表年1998
言語unknown
DOIhttps://doi.org/10.1063/1.476700
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