Quantum chemical study on the oxidation process of a hydrogen terminated Si surface

Teraishi; H.Takaba; A.Yamada; A.Endou; I.Gunji; A.Chaterjee; A.Miyamoto; K.Nakamura; M; Kitajima; Kazuo Teraishi; Hiromitsu Takaba; Aruba Yamada; Akira Endou; Isao Gunji; Abhijit Chatterjee; Momoji Kubo; Akira Miyamoto; Kazutaka Nakamura; Masahiro Kitajima; Teraishi; H.Takaba; A.Yamada; A.Endou; I.Gunji; A.Chaterjee; A.Miyamoto; K.Nakamura; M; Kitajima; Kazuo Teraishi; Hiromitsu Takaba; Aruba Yamada; Akira Endou; Isao Gunji; Abhijit Chatterjee; Momoji Kubo; Akira Miyamoto; Kazutaka Nakamura; Masahiro Kitajima

doi:10.1063/1.476700

(Quantum chemical study on the oxidation process of a hydrogen terminated Si surface)

Teraishi, H.Takaba, A.Yamada, A.Endou, I.Gunji, A.Chaterjee, A.Miyamoto, K.Nakamura, M, Kitajima, Kazuo Teraishi, Hiromitsu Takaba, Aruba Yamada, Akira Endou, Isao Gunji, Abhijit Chatterjee, Momoji Kubo, Akira Miyamoto, Kazutaka Nakamura, Masahiro Kitajima.

The Journal of Chemical Physics 109 [4] 1495-1504. 1998.

https://doi.org/10.1063/1.476700

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Created at: 2016-05-24 11:21:59 +0900Updated at: 2024-04-01 20:08:33 +0900