Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride
(Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride)

著者	Mitsuhiro Okada, Takumi Sawazaki, Kenji Watanabe, Takashi Taniguch, Hiroki Hibino, Hisanori Shinohara, Ryo Kitaura.
掲載誌名	ACS Nano 8 [8] 8273-8277 ISSN: 1936086X, 19360851 ESIでのカテゴリ: MATERIALS SCIENCE
出版社	American Chemical Society (ACS)
発表年	2014
言語	English
DOI	https://doi.org/10.1021/nn503093k
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