Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride
(Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride)
| 著者 | Mitsuhiro Okada, Takumi Sawazaki, Kenji Watanabe, Takashi Taniguch, Hiroki Hibino, Hisanori Shinohara, Ryo Kitaura. |
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| 掲載誌名 | ACS Nano 8 [8] 8273-8277 ISSN: 1936086X, 19360851 ESIでのカテゴリ: MATERIALS SCIENCE |
| 出版社 | American Chemical Society (ACS) |
| 発表年 | 2014 |
| 言語 | English |
| DOI | https://doi.org/10.1021/nn503093k |
| この文献をMendeleyにインポート |  |