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Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride
(Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride)

Mitsuhiro Okada, Takumi Sawazaki, Kenji Watanabe, Takashi Taniguch, Hiroki Hibino, Hisanori Shinohara, Ryo Kitaura.
ACS Nano 8 [8] 8273-8277. 2014.

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    作成時刻: 2016-05-24 17:33:23 +0900更新時刻: 2024-06-04 08:26:37 +0900

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