Direct Chemical Vapor Deposition Growth of WS<sub>2</sub> Atomic Layers on Hexagonal Boron Nitride | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride
(Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride)

Mitsuhiro Okada, Takumi Sawazaki, Kenji Watanabe, Takashi Taniguch, Hiroki Hibino, Hisanori Shinohara, Ryo Kitaura.

ACS Nano 8 [8] 8273-8277. 2014.

https://doi.org/10.1021/nn503093k

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北浦良

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 17:33:23 +0900更新時刻: 2024-04-02 03:58:08 +0900

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