O. Romanyuk; A. Paszuk; I. Gordeev; R.G. Wilks; S. Ueda; C. Hartmann; R. Félix; M. Bär; C. Schlueter; A. Gloskovskii; I. Bartoš; M. Nandy; J. Houdková; P. Jiříček; W. Jaegermann; J.P. Hofmann; T. Hannappel

doi:10.1016/j.apsusc.2022.154630

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Combining advanced photoelectron spectroscopy approaches to analyse deeply buried GaP(As)/Si(1 0 0) interfaces: Interfacial chemical states and complete band energy diagrams

O. Romanyuk, A. Paszuk, I. Gordeev, R.G. Wilks, S. Ueda, C. Hartmann, R. Félix, M. Bär, C. Schlueter, A. Gloskovskii, I. Bartoš, M. Nandy, J. Houdková, P. Jiříček, W. Jaegermann, J.P. Hofmann, T. Hannappel.

Applied Surface Science 605 154630. 2022.

https://doi.org/10.1016/j.apsusc.2022.154630

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作成時刻: 2022-09-14 03:18:41 +0900更新時刻: 2024-12-08 08:11:39 +0900