HOME > 論文 > 書誌詳細Reduction of interfacial SiO2 at HfO2/Si interface with Ta2O5 cap(Ta2O5キャップを用いたHfO2/Si界面のSiO2の薄膜化)Kazuyoshi Kobashi, Takahiro Nagata, Atsushi Ogura, Toshihide Nabatame, Toyohiro Chikyow. Journal of Applied Physics 114 [1] 014106. 2013.https://doi.org/10.1063/1.4811691 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 17:05:44 +0900更新時刻: 2024-03-31 13:18:58 +0900
