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Conduction band caused by oxygen vacancies in aluminum oxide for resistance random access memory

著者Seisuke Nigo, Masato Kubota, Yoshitomo Harada, Taisei Hirayama, Seiichi Kato, Hideaki Kitazawa, Giyuu Kido.
掲載誌名Journal of Applied Physics 112 [3] 033711
ISSN: 00218979, 10897550
ESIでのカテゴリ: PHYSICS
出版社AIP Publishing
発表年2012
言語English
DOIhttps://doi.org/10.1063/1.4745048
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