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Ultrafast Production of Silicon via Aluminothermic Reduction of Tetrachlorosilane in Thermal Plasma Jet
(熱プラズマにおけるSiCl4のAl熱還元を用いたSiの超高速生成)

SHINODA, Kentaro, MURAKAMI, Hideyuki, SAWABE Yoshinari, SAEGUSA Kunio.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-02-27 02:05:13 +0900Updated at: 2017-03-17 04:12:38 +0900

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