HOME > Proceedings > DetailUltrafast Production of Silicon via Aluminothermic Reduction of Tetrachlorosilane in Thermal Plasma Jet(熱プラズマにおけるSiCl4のAl熱還元を用いたSiの超高速生成)SHINODA, Kentaro, MURAKAMI, Hideyuki, SAWABE Yoshinari, SAEGUSA Kunio. Proceedings of ISPC20 1-4. 2011.NIMS author(s)MURAKAMI, HideyukiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-27 02:05:13 +0900Updated at: 2017-03-17 04:12:38 +0900