HOME > 会議録 > 書誌詳細Diameter-controlled Defect-free Si Nanostructure Using Neutral Beam Etching for Realistic Quantum Effect DevicesTakeshi Hashimoto, Chi-Hsien Huang, Tomohiro Kubota, TAKEGUCHI, Masaki, Kensuke Nishioka, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita, Seiji Samukawa. Proceedings of 29th International Symposium on Dry Process 19-20. 2007.NIMS著者竹口 雅樹Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 01:27:55 +0900 更新時刻: 2017-03-17 03:29:01 +0900
