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基板にかけられた高電圧パルスにより発生するグロー放電プラズマを用いたプラズマイオン注入による炭素膜の堆積
(Deposition of carbon films by plasma based ion implantation using glow discharge plasma ignited by high voltage pulses applied t)
The 6th International Symposium on Sputtering & Plasma Processes. June 13, 2001-June 15, 2001.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 10:59:25 +0900 Updated at: 2017-07-10 18:15:05 +0900