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室温低密度酸素プラズマにより作製した超薄シリコン酸化膜の電気的性質
(Electrical properties of the ultrathin silicon oxide film grown by low density oxygen plasma at room temperature)
44th National Symposium of Americal Vaccum Society. October 20, 1997-October 24, 1997.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-18 01:21:25 +0900 Updated at: 2017-07-10 17:45:06 +0900