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量子化学計算によるシリコン表面からのSiO2の脱離過程
(SiO desorption process from Si surface as invertigated by quantum chemical calculations)
原子スケール制御表面・界面国際シンポジウム. October 27, 1997-October 30, 1997.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-18 01:19:18 +0900 Updated at: 2017-07-10 17:44:01 +0900