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絶縁体基板上へのエピタキシャルβFeSi2薄膜の合成とその基礎特性
(Growth of βFeSi2 thin films on insulator substrates and their basic property)
第41回セラミックス基礎科学討論会. January 22, 2003-January 23, 2003.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-18 03:07:43 +0900 Updated at: 2017-07-10 18:39:06 +0900