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面内配向バッファー層作製のためのバイアススパッタ法の開発とYBCO薄膜への応用
(Development of modified bias sputtering technique to fabricated in-plane aligned buffer layers for YBCO film growth)
新超伝導材料研究会ワークショップ. 1997-11-12.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-18 01:21:49 +0900 Updated at: 2017-07-10 17:45:19 +0900